3Inch N-Si(100)+SiO2 (300nm)] wafer, Prime Grade, LR, SSP

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Description

 

Specifications Description
Diameter 3 Inch (76.2 mm)
Grade Prime Grade
Oxide Thickness 300 nm (oxide layer on both side)
Tolerance +/-5%
Substrate Material Silicon (Si)
Substrate Orientation <100>
Si Conductivity N-Type  (Phosphorous-doped)
Si Resistivity 0.001-0.009 Ohm-cm (Ω-cm)
Surface One side polished (SSP)
Packing Packed with class 100 clean wafer case or bag in a class 1000 clean room

 

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