Silicon Nitride (Si3N4) wafers
Silicon nitride layers are highly resistant to heat and oxidation, and have many applications in micro-mechanics and micro-electronics. A thin film of silicon nitride is very hard, and can act as a membrane. LPCVD nitride wafers can be easily deposited and produce uniform, pure film. They are also a popular choice for passivation layers.
Here are some common specifications for GaN wafers:
Silicon Nitride on Silicon Specifications:
- Type/Dopant: P-type/B
- Orientation: (100)
- Size: Dia.:100 x 0.525 mm
- Surface: single side polished
- Resistivity: 0.001 ~ 0.005 ohm-cm
- Si3N4 film thickness: 100 nm
