Oxide Ceramic Sputtering Targets

Description

List of few Oxide Sputtering Targets

Aluminum Oxide (Al₂O₃), Antimony Oxide (Sb₂O₃), Barium Titanate (BaTiO₃), Bismuth Oxide (Bi₂O₃), Cerium Oxide (CeO₂), Copper Oxide (CuO), Chromium Oxide (Cr₂O₃), Dysprosium Oxide (Dy₂O₃), Erbium Oxide (Er₂O₃), Europium Oxide (Eu₂O₃), Gadolinium Oxide (Gd₂O₃), Gallium Oxide (Ga₂O₃), Hafnium Oxide (HfO₂), Indium Oxide (In₂O₃), Indium Tin Oxide (ITO- In2O3/SnO2), Iron Oxide (Fe₂O₃), Iron Oxide (Fe₃O₄), Lead Titanate (PbTiO₃), Lead Zirconate (PbZrO₃), Lutetium Oxide (Lu₂O₃), Magnesium Oxide (MgO), Molybdenum Oxide (MoO₃), Neodymium Oxide (Nd₂O₃), Silicon Dioxide (SiO₂), Silicon Monoxide (SiO), Strontium Titanate (SrTiO₃), Tantalum Pentoxide (Ta₂O₅), Titanium Dioxide (TiO₂), Titanium Monoxide (TiO), Titanium Oxide (Ti₃O₅), Tin Oxide (SnO₂) and Tungsten Oxide (WO₃).